The Standard Etch Cell

The Standard Etch CellOne of the most common applications of an electrochemical etching cell is the preparation of a Nanocrystalline Porous Silicon Layer on a single crystal Si wafer. Application note To perform an electrochemical process, a square conducting sample is placed on the cell base, using a piece of aluminum foil as a back contact. The setup is sealed by an O ring to prevent electrolyte leakage. The cell is filled with an electrolyte, and the wire electrode is

Materials Casing and cap are made of Nickel plated A3 steel and sealing O-ring made of nylon

Growing Method:                VGF

fundamental interval: 38

Resistivity:  14 ohm/sq

m 180mm 240m 5kg 280mm 155m 5kg 25

EQ-HDS-250 is a hybrid film applicator that can do tape coating for thicker film and slot die coating for thin film

It also enables in-situ spectral acquisition for detection

2 x capillary with PE frit

The warranty does not cover any corrosion or misuse caused by the end-user

Non-metal Electrodes

Coulombic Efficiency for the first cycle (%)

Size:            10 mm x 5 mm x 1